Piezoresistive effect of p-type silicon nanowires fabricated by a top-down process using FIB implantation and wet etching

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Author(s)
Hoang-Phuong, Phan
Kozeki, Takahiro
Dinh, Toan
Fujii, Tatsuya
Qamar, Afzaal
Zhu, Yong
Namazu, Takahiro
Nam-Trung, Nguyen
Dao, Dzung Viet
Year published
2015
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Show full item recordAbstract
The piezoresistive effect in silicon nanowires (SiNWs) has attracted a great deal of interest for NEMS devices. Most of the piezoresistive SiNWs reported in the literature were fabricated using the bottom up method or top down processes such as electron beam lithography (EBL). Focused ion beam (FIB), on the other hand, is more compatible with CMOS integration than the bottom up method, and is simpler and more capable of fabricating very narrow Si nanostructures compared to EBL and photolithography. Taking the advantages of FIB, this paper presents for the first time the piezoresistive effect of p-type SiNWs fabricated using ...
View more >The piezoresistive effect in silicon nanowires (SiNWs) has attracted a great deal of interest for NEMS devices. Most of the piezoresistive SiNWs reported in the literature were fabricated using the bottom up method or top down processes such as electron beam lithography (EBL). Focused ion beam (FIB), on the other hand, is more compatible with CMOS integration than the bottom up method, and is simpler and more capable of fabricating very narrow Si nanostructures compared to EBL and photolithography. Taking the advantages of FIB, this paper presents for the first time the piezoresistive effect of p-type SiNWs fabricated using focused ion beam implantation and wet etching. The SiNWs were locally amorphized by Ga+ ion implantation, selectively wet-etched, and thermally annealed at 700 °C. A relatively large gauge factor of approximately 47 was found in the annealed SiNWs, indicating the potential of using the piezoresistive effect in top-down fabricated SiNWs for developing NEMS sensors.
View less >
View more >The piezoresistive effect in silicon nanowires (SiNWs) has attracted a great deal of interest for NEMS devices. Most of the piezoresistive SiNWs reported in the literature were fabricated using the bottom up method or top down processes such as electron beam lithography (EBL). Focused ion beam (FIB), on the other hand, is more compatible with CMOS integration than the bottom up method, and is simpler and more capable of fabricating very narrow Si nanostructures compared to EBL and photolithography. Taking the advantages of FIB, this paper presents for the first time the piezoresistive effect of p-type SiNWs fabricated using focused ion beam implantation and wet etching. The SiNWs were locally amorphized by Ga+ ion implantation, selectively wet-etched, and thermally annealed at 700 °C. A relatively large gauge factor of approximately 47 was found in the annealed SiNWs, indicating the potential of using the piezoresistive effect in top-down fabricated SiNWs for developing NEMS sensors.
View less >
Journal Title
RSC Advances
Volume
5
Issue
100
Copyright Statement
© 2014 Royal Society of Chemistry. This is the author-manuscript version of this paper. Reproduced in accordance with the copyright policy of the publisher. Please refer to the journal website for access to the definitive, published version.
Subject
Chemical sciences
Microelectronics
Microelectromechanical systems (MEMS)