Immobilization of Dendrimers on Si-C Linked Carboxyalic Acid-Terminated Monolayers on Silicon(111)

View/ Open
Author(s)
Bocking, Till
Wong, Elicia LS
James, Michael
Watson, Jolanta A
Brown, Christopher L
Chilcott, Terry C
Barrow, Kevin D
Coster, Hans GL
Year published
2006
Metadata
Show full item recordAbstract
Poly(amidoamine) dendrimers were attached to activated undecanoic acid monolayers, covalently linked to smooth silicon surfaces via Si-C bonds. The resulting ultra-thin dendrimer films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray reflectometry (XR) and atomic force microscopy (AFM). XPS results suggested amide bond formation between the dendrimer and the surface carboxylic acid groups. XR yielded thicknesses of 10 Šfor the alkyl region of the undecanoic acid monolayer and 12 Šfor the dendrimer layer, considerably smaller than the diameter of these spherical macromolecules in solution. This was consistent ...
View more >Poly(amidoamine) dendrimers were attached to activated undecanoic acid monolayers, covalently linked to smooth silicon surfaces via Si-C bonds. The resulting ultra-thin dendrimer films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray reflectometry (XR) and atomic force microscopy (AFM). XPS results suggested amide bond formation between the dendrimer and the surface carboxylic acid groups. XR yielded thicknesses of 10 Šfor the alkyl region of the undecanoic acid monolayer and 12 Šfor the dendrimer layer, considerably smaller than the diameter of these spherical macromolecules in solution. This was consistent with AFM images showing collapsed dendrimers on the surface. It was concluded that the deformation arose from a large number of amine groups on the surface of each dendrimer reacting efficiently with the activated surface, whereby the dendrimers can deform to fill voids while spreading over the activated surface to form a homogeneous macromolecular layer.
View less >
View more >Poly(amidoamine) dendrimers were attached to activated undecanoic acid monolayers, covalently linked to smooth silicon surfaces via Si-C bonds. The resulting ultra-thin dendrimer films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray reflectometry (XR) and atomic force microscopy (AFM). XPS results suggested amide bond formation between the dendrimer and the surface carboxylic acid groups. XR yielded thicknesses of 10 Šfor the alkyl region of the undecanoic acid monolayer and 12 Šfor the dendrimer layer, considerably smaller than the diameter of these spherical macromolecules in solution. This was consistent with AFM images showing collapsed dendrimers on the surface. It was concluded that the deformation arose from a large number of amine groups on the surface of each dendrimer reacting efficiently with the activated surface, whereby the dendrimers can deform to fill voids while spreading over the activated surface to form a homogeneous macromolecular layer.
View less >
Journal Title
Thin Solid Films
Volume
515
Issue
4
Publisher URI
Copyright Statement
© 2006 Elsevier. Reproduced in accordance with the copyright policy of the publisher. This journal is available online, use hypertext links.
Subject
Physical sciences
Engineering