Towards creation of iron nanodots using metastable atom lithography
Author(s)
Palmer, AJ
Baker, M
Sang, RT
Griffith University Author(s)
Year published
2006
Metadata
Show full item recordAbstract
Iron structures with dimensions of the order of the minimum domain size (~50 nm at room temperature) may provide us with a new high-density data storage method. Limitations have been observed in existing depositional atom lithography schemes for producing these structures. We present a proof-in-principle experiment using an alternative scheme based upon direct exposure metastable neon-atom lithography. Iron structures with dimensions of the order of 7.5 孠are produced by this method. Extension of this work to the application of standing-wave atom lithography and laser cooling flux enhancement techniques is discussed as a ...
View more >Iron structures with dimensions of the order of the minimum domain size (~50 nm at room temperature) may provide us with a new high-density data storage method. Limitations have been observed in existing depositional atom lithography schemes for producing these structures. We present a proof-in-principle experiment using an alternative scheme based upon direct exposure metastable neon-atom lithography. Iron structures with dimensions of the order of 7.5 孠are produced by this method. Extension of this work to the application of standing-wave atom lithography and laser cooling flux enhancement techniques is discussed as a method for reducing dimensions to a size equating to a dot array density of around 0.1 Gbit mm-2.
View less >
View more >Iron structures with dimensions of the order of the minimum domain size (~50 nm at room temperature) may provide us with a new high-density data storage method. Limitations have been observed in existing depositional atom lithography schemes for producing these structures. We present a proof-in-principle experiment using an alternative scheme based upon direct exposure metastable neon-atom lithography. Iron structures with dimensions of the order of 7.5 孠are produced by this method. Extension of this work to the application of standing-wave atom lithography and laser cooling flux enhancement techniques is discussed as a method for reducing dimensions to a size equating to a dot array density of around 0.1 Gbit mm-2.
View less >
Journal Title
Nanotechnology
Volume
17