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dc.contributor.authorPalmer, AJ
dc.contributor.authorBaker, M
dc.contributor.authorSang, RT
dc.contributor.editorM.Welland
dc.date.accessioned2017-05-03T11:34:48Z
dc.date.available2017-05-03T11:34:48Z
dc.date.issued2006
dc.date.modified2009-09-14T07:15:23Z
dc.identifier.issn0957-4484
dc.identifier.doi10.1088/0957-4484/17/4/054
dc.identifier.urihttp://hdl.handle.net/10072/14370
dc.description.abstractIron structures with dimensions of the order of the minimum domain size (~50 nm at room temperature) may provide us with a new high-density data storage method. Limitations have been observed in existing depositional atom lithography schemes for producing these structures. We present a proof-in-principle experiment using an alternative scheme based upon direct exposure metastable neon-atom lithography. Iron structures with dimensions of the order of 7.5 孠are produced by this method. Extension of this work to the application of standing-wave atom lithography and laser cooling flux enhancement techniques is discussed as a method for reducing dimensions to a size equating to a dot array density of around 0.1 Gbit mm-2.
dc.description.peerreviewedYes
dc.description.publicationstatusYes
dc.languageEnglish
dc.language.isoeng
dc.publisherInstitute of Physics Publishing
dc.publisher.placeUnited Kingdom
dc.publisher.urihttps://iopscience.iop.org/article/10.1088/0957-4484/17/4/054
dc.relation.ispartofstudentpublicationN
dc.relation.ispartofpagefrom1166
dc.relation.ispartofpageto1170
dc.relation.ispartofjournalNanotechnology
dc.relation.ispartofvolume17
dc.rights.retentionY
dc.subject.fieldofresearchcode240301
dc.titleTowards creation of iron nanodots using metastable atom lithography
dc.typeJournal article
dc.type.descriptionC1 - Articles
dc.type.codeC - Journal Articles
gro.date.issued2006
gro.hasfulltextNo Full Text
gro.griffith.authorSang, Robert T.


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