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dc.contributor.authorSweatman, D
dc.contributor.authorDimitrijev, S
dc.contributor.authorLi, HF
dc.contributor.authorTanner, P
dc.contributor.authorHarrison, HB
dc.contributor.editorRiley, TJ
dc.contributor.editorGelpey, JC
dc.contributor.editorRoozeboom, F
dc.contributor.editorSaito, S
dc.date.accessioned2018-11-09T12:33:03Z
dc.date.available2018-11-09T12:33:03Z
dc.date.issued1997
dc.identifier.isbn1-55899-374-6
dc.identifier.issn0272-9172
dc.identifier.urihttp://hdl.handle.net/10072/180795
dc.languageEnglish
dc.publisherMaterials Research Society
dc.publisher.placeWarrendale,PA,US
dc.relation.ispartofconferencenameSymposium on Rapid Thermal and Integrated Processing VI, at the 1997 MRS Spring Meeting
dc.relation.ispartofconferencetitleRAPID THERMAL AND INTEGRATED PROCESSING VI
dc.relation.ispartofdatefrom1997-04-01
dc.relation.ispartofdateto1997-04-04
dc.relation.ispartoflocationSAN FRANCISCO, CA
dc.relation.ispartofpagefrom413
dc.relation.ispartofpageto418
dc.relation.ispartofvolume470
dc.titleGrowth and Nitridation of Silicon-dioxide Films on Silicon-carbide
dc.typeConference output
dc.type.descriptionE2 - Conferences (Non Refereed)
dc.type.codeE - Conference Publications
gro.hasfulltextNo Full Text
gro.griffith.authorHarrison, Barry B.
gro.griffith.authorDimitrijev, Sima
gro.griffith.authorSweatman, Denis R.
gro.griffith.authorTanner, Philip G.
gro.griffith.authorLi, Hui-feng


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