A proposed nanofabrication technique using optical masks for metastable atom lithography
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We present an overview of our progress towards using optical fields as 'light masks' for metastable atomic beam lithography. Numerical simulations have been undertaken to model the interaction of a beam of metastable neon atoms with a standing wave of 640.2 nm laser light. The current experimental setup and the proposed scheme for focusing the atoms is detailed
Proceedings of the 2004 Conference on Optoelectronic and Microelectronic Materials and Devices
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