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dc.contributor.authorPalmer, Adamen_US
dc.contributor.authorBaker, Marken_US
dc.contributor.authorSang, Roberten_US
dc.contributor.editorAleksandar D. Rakić, Yew Tong Yeowen_US
dc.date.accessioned2017-04-24T14:33:12Z
dc.date.available2017-04-24T14:33:12Z
dc.date.issued2004en_US
dc.date.modified2010-07-20T21:55:58Z
dc.identifier.doi10.1109/COMMAD.2004.1577561en_AU
dc.identifier.urihttp://hdl.handle.net/10072/32446
dc.description.abstractIron structures with dimensions comparable to the minimum domain size of 5 nm may provide us with a new high-density data storage method. Several limitations have been observed in existing depositional atom lithography schemes for producing these structures. We will present an alternative scheme using metastable neon atom lithographyen_US
dc.description.peerreviewedYesen_US
dc.description.publicationstatusYesen_AU
dc.languageEnglishen_US
dc.language.isoen_AU
dc.publisherIEEEen_US
dc.publisher.placePiscataway, USAen_US
dc.relation.ispartofconferencename2004 conference on Optoelectronic and Microelectronic Materials and Devicesen_US
dc.relation.ispartofconferencetitle2004 conference on Optoelectronic and Microelectronic Materials and Devicesen_US
dc.relation.ispartofdatefrom2004-12-08en_US
dc.relation.ispartofdateto2004-12-10en_US
dc.relation.ispartoflocationBrisbaneen_US
dc.subject.fieldofresearchcode240301en_US
dc.titleProgress towards the creation of iron nanodots using atom lithographyen_US
dc.typeConference outputen_US
dc.type.descriptionE1 - Conference Publications (HERDC)en_US
dc.type.codeE - Conference Publicationsen_US
gro.date.issued2004
gro.hasfulltextNo Full Text


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