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dc.contributor.authorLi, L
dc.contributor.authorWang, J
dc.contributor.authorLi, HZ
dc.date.accessioned2017-06-19T01:30:47Z
dc.date.available2017-06-19T01:30:47Z
dc.date.issued2016
dc.identifier.issn0255-5476
dc.identifier.doi10.4028/www.scientific.net/MSF.874.291
dc.identifier.urihttp://hdl.handle.net/10072/338806
dc.description.abstractAn experimental study is reported to characterise the femtosecond (FS) laser grooving process for Germanium (Ge) substrates. The effects of process parameters, including laser fluence, pulse repetition rate and scan speed, on the groove characteristics, material removal rate (MRR) and heat affected zone (HAZ) size are discussed. It is shown that with properly selected process parameters, high quality micro-grooves can be obtained on Ge wafers. Recommendations are finally made on the selection of the most appropriate process parameters for FS micro-grooving of Ge substrates.
dc.description.peerreviewedYes
dc.languageEnglish
dc.language.isoeng
dc.publisherTrans Tech Publications
dc.relation.ispartofpagefrom291
dc.relation.ispartofpageto296
dc.relation.ispartofjournalMaterials Science Forum
dc.relation.ispartofvolume874
dc.subject.fieldofresearchPhysical chemistry
dc.subject.fieldofresearchMachining
dc.subject.fieldofresearchMaterials engineering
dc.subject.fieldofresearchcode3406
dc.subject.fieldofresearchcode401406
dc.subject.fieldofresearchcode4016
dc.titleCharacterisation of the femtosecond laser micro-grooving process for Germanium substrates
dc.typeJournal article
dc.type.descriptionC1 - Articles
dc.type.codeC - Journal Articles
gro.hasfulltextNo Full Text
gro.griffith.authorLi, Huaizhong


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