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  • Comparative study of electrical characteristics for n-type 4H-SiC planar and trench MOS capacitors annealed in ambient NO

    Author(s)
    Shen, Zhan-Wei
    Zhang, Feng
    Dimitrijev, Sima
    Han, Ji-Sheng
    Yan, Guo-Guo
    Wen, Zheng-Xin
    Zhao, Wan-Shun
    Wang, Lei
    Liu, Xing-Fang
    Sun, Guo-Sheng
    Zeng, Yi-Ping
    Griffith University Author(s)
    Dimitrijev, Sima
    Year published
    2017
    Metadata
    Show full item record
    Abstract
    The interface properties and electrical characteristics of the n-type 4H–SiC planar and trench metal–oxide–semiconductor (MOS) capacitors are investigated by measuring the capacitance voltage and current voltage. The flat-band voltage and interface state density are evaluated by the quasi-static method. It is not effective on further improving the interface properties annealing at 1250°C in NO ambient for above 1 h due to the increasing interface shallow and fast states. These shallow states reduce the effective positive fixed charge density in the oxide. For the vertical MOS capacitors on the ($11\bar{2}0$) and ($1\bar{1}00$) ...
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    The interface properties and electrical characteristics of the n-type 4H–SiC planar and trench metal–oxide–semiconductor (MOS) capacitors are investigated by measuring the capacitance voltage and current voltage. The flat-band voltage and interface state density are evaluated by the quasi-static method. It is not effective on further improving the interface properties annealing at 1250°C in NO ambient for above 1 h due to the increasing interface shallow and fast states. These shallow states reduce the effective positive fixed charge density in the oxide. For the vertical MOS capacitors on the ($11\bar{2}0$) and ($1\bar{1}00$) faces, the interface state density can be reduced by approximately one order of magnitude, in comparison to the result of the planar MOS capacitors on the (0001) face under the same NO annealing condition. In addition, it is found that Fowler–Nordheim tunneling current occurs at an oxide electric field of 7 MV/cm for the planar MOS device. However, Poole–Frenkel conduction current occurs at a lower electric field of 4 MV/cm for the trench MOS capacitor. This is due to the local field crowded at the trench corner severely causing the electrons to be early captured at or emitted from the SiO2/SiC interface. These results provide a reference for an in-depth understanding of the mobility-limiting factors and long term reliability of the trench and planar SiO2/SiC interfaces.
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    Journal Title
    Chinese Physics B
    Volume
    26
    Issue
    10
    DOI
    https://doi.org/10.1088/1674-1056/26/10/107101
    Subject
    Mathematical sciences
    Physical sciences
    Particle and high energy physics not elsewhere classified
    Engineering
    Publication URI
    http://hdl.handle.net/10072/356297
    Collection
    • Journal articles

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