• myGriffith
    • Staff portal
    • Contact Us⌄
      • Future student enquiries 1800 677 728
      • Current student enquiries 1800 154 055
      • International enquiries +61 7 3735 6425
      • General enquiries 07 3735 7111
      • Online enquiries
      • Staff phonebook
    View Item 
    •   Home
    • Griffith Theses
    • Theses - Higher Degree by Research
    • View Item
    • Home
    • Griffith Theses
    • Theses - Higher Degree by Research
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Browse

  • All of Griffith Research Online
    • Communities & Collections
    • Authors
    • By Issue Date
    • Titles
  • This Collection
    • Authors
    • By Issue Date
    • Titles
  • Statistics

  • Most Popular Items
  • Statistics by Country
  • Most Popular Authors
  • Support

  • Contact us
  • FAQs
  • Admin login

  • Login
  • Metastable Atom Lithography

    Thumbnail
    View/Open
    02Whole.pdf (3.664Mb)
    Author(s)
    Baker, Mark A.
    Primary Supervisor
    Sang, Robert
    Other Supervisors
    MacGillivray, Bill
    Year published
    2008
    Metadata
    Show full item record
    Abstract
    This thesis describes the development of a rare gas metastable atomic beam apparatus, and its application to atom lithography. The principal component of the apparatus is the supersonic DC discharge source. The source parameters, such as operating pressure, skimmer distance, discharge current and nozzle shape were optimised to generate a bright beam of excited state metastable neon and argon, with typical flux of 5×10¹? atoms sr?¹ and 3×10¹? atoms sr?¹ respectively. This apparatus was used to investigate the pattern formation of self assembled monolayer (SAM) resists prepared on Au/Si samples exposed to metastable beams of ...
    View more >
    This thesis describes the development of a rare gas metastable atomic beam apparatus, and its application to atom lithography. The principal component of the apparatus is the supersonic DC discharge source. The source parameters, such as operating pressure, skimmer distance, discharge current and nozzle shape were optimised to generate a bright beam of excited state metastable neon and argon, with typical flux of 5×10¹? atoms sr?¹ and 3×10¹? atoms sr?¹ respectively. This apparatus was used to investigate the pattern formation of self assembled monolayer (SAM) resists prepared on Au/Si samples exposed to metastable beams of Ar* and Ne*, through microfabricated contact masks. Positive and negative tone patterning was observed, with supporting XPS analysis attributing the negative tone resists to contamination from pump oil vapour. The formation of negative tone contamination resists by the metastable neon beam was applied to the generation of micrometer sized Fe structures using contact masks. A 3-step etch process was developed and refined, resulting in 7.5µm Fe microdot structures on a Si substrate. A bright transverse and longitudinally cooled and collimated metastable neon beam source for atom lithography was developed. The transverse atomic beam collimation stage produced a collimated beam flux of of 1.4×10¹? s?¹, with a divergence of 22.8 mrad. Axial slowing of the atomic beam was demonstrated with the development of a Zeeman slower. Numerical simulations were undertaken to calculate the motion of metastable neon atoms in a one-dimensional standing wave light field mask. The simulations show the dynamics and atom distributions for the focusing regime (low power) and channeling regime (high power). Future refinements of the apparatus should allow the realisation of nanofabricated structures utilising optical masking techniques.
    View less >
    Thesis Type
    Thesis (PhD Doctorate)
    Degree Program
    Doctor of Philosophy (PhD)
    School
    School of Biomolecular and Physical Sciences
    DOI
    https://doi.org/10.25904/1912/2652
    Copyright Statement
    The author owns the copyright in this thesis, unless stated otherwise.
    Item Access Status
    Public
    Subject
    atom lithography
    metastable neon atoms
    atomic nanofabrication
    atomic beam
    standing wave
    Publication URI
    http://hdl.handle.net/10072/365477
    Collection
    • Theses - Higher Degree by Research

    Footer

    Disclaimer

    • Privacy policy
    • Copyright matters
    • CRICOS Provider - 00233E

    Tagline

    • Gold Coast
    • Logan
    • Brisbane - Queensland, Australia
    First Peoples of Australia
    • Aboriginal
    • Torres Strait Islander