A UV Free Source of Metastable Neon Atoms for Atom Lithography

Abstract

A high flux metastable Neon atomic beam was designed and characterised. Atom optical enhancement of the beam using a two-dimensional optical collimator, novel two beam Zeeman slower and hexapole magnetic guide was performed to produce a UV-free metastable flux of (4.35 × 109 ± 4 × 107) atoms s−1. Investigations of several resists for neutral atom lithography were undertaken. A quantitative investigation of the wetting properties of ethanethiol (ET) and dodecanethiol (DDT) self-assembled monolayers (SAM’s) exposed to various metastable dosages was carried out. A mechanism for the poor lithographic patterning using ET was proposed and the negative contrast patterning observed for this SAM was similar to those observed for bare gold substrates and were attributed to mechanical pump oil (MPO) contamination resists. Negative patterned resists were used to produce 7.5 μm iron dots on a silicon substrate via neutral atom lithography. This scheme was found to be very robust and free from the laser cooling issues of alternative direct depositional schemes. Numerical simulations have shown that two dimensional arrays of magnetic nanodots may be produced this way, paving the way for a magnetic storage option with a density of " 0.1 Gbit mm−2.