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  • Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

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    Author(s)
    Santhosh, Neelakandan M
    Filipic, Gregor
    Tatarova, Elena
    Baranov, Oleg
    Kondo, Hiroki
    Sekine, Makoto
    Hori, Masaru
    Ostrikov, Kostya Ken
    Cvelbar, Uros
    Griffith University Author(s)
    Ostrikov, Ken
    Year published
    2018
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    Abstract
    Carbon, one of the most abundant materials, is very attractive for many applications because it exists in a variety of forms based on dimensions, such as zero-dimensional (0D), one-dimensional (1D), two-dimensional (2D), and-three dimensional (3D). Carbon nanowall (CNW) is a vertically-oriented 2D form of a graphene-like structure with open boundaries, sharp edges, nonstacking morphology, large interlayer spacing, and a huge surface area. Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the large-scale synthesis and functionalization of carbon nanowalls (CNWs) with different types of plasma activation. ...
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    Carbon, one of the most abundant materials, is very attractive for many applications because it exists in a variety of forms based on dimensions, such as zero-dimensional (0D), one-dimensional (1D), two-dimensional (2D), and-three dimensional (3D). Carbon nanowall (CNW) is a vertically-oriented 2D form of a graphene-like structure with open boundaries, sharp edges, nonstacking morphology, large interlayer spacing, and a huge surface area. Plasma-enhanced chemical vapor deposition (PECVD) is widely used for the large-scale synthesis and functionalization of carbon nanowalls (CNWs) with different types of plasma activation. Plasma-enhanced techniques open up possibilities to improve the structure and morphology of CNWs by controlling the plasma discharge parameters. Plasma-assisted surface treatment on CNWs improves their stability against structural degradation and surface chemistry with enhanced electrical and chemical properties. These advantages broaden the applications of CNWs in electrochemical energy storage devices, catalysis, and electronic devices and sensing devices to extremely thin black body coatings. However, the controlled growth of CNWs for specific applications remains a challenge. In these aspects, this review discusses the growth of CNWs using different plasma activation, the influence of various plasma-discharge parameters, and plasma-assisted surface treatment techniques for tailoring the properties of CNWs. The challenges and possibilities of CNW-related research are also discussed.
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    Journal Title
    MICROMACHINES
    Volume
    9
    Issue
    11
    DOI
    https://doi.org/10.3390/mi9110565
    Copyright Statement
    © 2018 the Authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license, which permits unrestricted, distribution and reproduction in any medium, providing that the work is properly cited.
    Subject
    Nanotechnology
    Publication URI
    http://hdl.handle.net/10072/385264
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    • Journal articles

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