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dc.contributor.authorLim, H
dc.contributor.authorKim, J
dc.contributor.authorKani, K
dc.contributor.authorMasud, MK
dc.contributor.authorPark, H
dc.contributor.authorKim, M
dc.contributor.authorAlsheri, SM
dc.contributor.authorAhamad, T
dc.contributor.authorAlhokbany, N
dc.contributor.authorNa, J
dc.contributor.authorMalgras, V
dc.contributor.authorBando, Y
dc.contributor.authorYamauchi, Y
dc.date.accessioned2019-11-11T04:18:52Z
dc.date.available2019-11-11T04:18:52Z
dc.date.issued2019
dc.identifier.issn1613-6810
dc.identifier.doi10.1002/smll.201902934
dc.identifier.urihttp://hdl.handle.net/10072/389033
dc.description.abstractMesoporous noble metals and their patterning techniques for obtaining unique patterned structures are highly attractive for electrocatalysis, photocatalysis, and optoelectronics device applications owing to their expedient properties such as high level of exposed active locations, cascade electrocatalytic sites, and large surface area. However, patterning techniques for mesoporous substrates are still limited to metal oxide and silica films, although there is growing demand for developing techniques related to patterning mesoporous metals. In this study, the first demonstration of mesoporous metal films on patterned gold (Au) substrates, prefabricated using photolithographic techniques, is reported. First, different growth rates of mesoporous Au metal films on patterned Au substrates are demonstrated by varying deposition times and voltages. In addition, mesoporous Au films are also fabricated on various patterns of Au substrates including stripe and mesh lines. An alternative fabrication method using a photoresist insulating mask also yields growth of mesoporous Au within the patterning. Moreover, patterned mesoporous films of palladium (Pd) and palladium–copper alloy (PdCu) are demonstrated on the same types of substrates to show versatility of this method. Patterned mesoporous Au films (PMGF) shows higher electrochemically-active surface area (ECSA) and higher sensitivity toward glucose oxidation than nonpatterned mesoporous Au films (NMGF).
dc.description.peerreviewedYes
dc.languageEnglish
dc.publisherWiley
dc.publisher.placeGermany
dc.relation.ispartofpagefrom1
dc.relation.ispartofpageto9
dc.relation.ispartofjournalSmall
dc.subject.fieldofresearchNanotechnology
dc.subject.fieldofresearchcode4018
dc.titleDesigned Patterning of Mesoporous Metal Films Based on Electrochemical Micelle Assembly Combined with Lithographical Techniques
dc.typeJournal article
dc.type.descriptionC1 - Articles
dcterms.bibliographicCitationLim, H; Kim, J; Kani, K; Masud, MK; Park, H; Kim, M; Alsheri, SM; Ahamad, T; Alhokbany, N; Na, J; Malgras, V; Bando, Y; Yamauchi, Y, Designed Patterning of Mesoporous Metal Films Based on Electrochemical Micelle Assembly Combined with Lithographical Techniques, Small, 2019, pp. 1-9
dc.date.updated2019-11-11T00:17:00Z
gro.description.notepublicThis publication has been entered into Griffith Research Online as an Advanced Online Version
gro.hasfulltextNo Full Text
gro.griffith.authorMasud, Mostafa Kamal K.


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