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dc.contributor.authorPetra, Rafidah
dc.contributor.authorOo, Swe Zin
dc.contributor.authorTarazona, Antulio
dc.contributor.authorCernansky, Robert
dc.contributor.authorReynolds, Scott A
dc.contributor.authorKhokhar, Ali Z
dc.contributor.authorMittal, Vinita
dc.contributor.authorThomson, David J
dc.contributor.authorPoliti, Alberto
dc.contributor.authorMashanovich, Goran Z
dc.contributor.authorReed, Graham T
dc.contributor.authorChong, Harold MH
dc.date.accessioned2020-01-14T01:59:58Z
dc.date.available2020-01-14T01:59:58Z
dc.date.issued2019
dc.identifier.issn1094-4087
dc.identifier.doi10.1364/OE.27.015735
dc.identifier.urihttp://hdl.handle.net/10072/390214
dc.description.abstractWe present interlayer slope waveguides, designed to guide light from one level to another in a multi-layer silicon photonics platform. The waveguide is fabricated from hydrogenated amorphous silicon (a-Si:H) film, deposited using hot-wire chemical vapor deposition (HWCVD) at a temperature of 230°C. The interlayer slope waveguide is comprises of a lower level input waveguide and an upper level output waveguide, connected by a waveguide on a slope, with vertical separation to isolate other crossing waveguides. Measured loss of 0.17 dB/slope was obtained for waveguide dimensions of 600 nm waveguide width (w) and 400 nm core thickness (h) at a wavelength of 1550 nm and for transverse electric (TE) mode polarization.
dc.description.peerreviewedYes
dc.languageEnglish
dc.language.isoeng
dc.publisherOptical Society of America
dc.relation.ispartofpagefrom15735
dc.relation.ispartofpageto15749
dc.relation.ispartofissue11
dc.relation.ispartofjournalOptics Express
dc.relation.ispartofvolume27
dc.subject.fieldofresearchOptical Physics
dc.subject.fieldofresearchElectrical and Electronic Engineering
dc.subject.fieldofresearchCommunications Technologies
dc.subject.fieldofresearchcode0205
dc.subject.fieldofresearchcode0906
dc.subject.fieldofresearchcode1005
dc.subject.keywordsScience & Technology
dc.subject.keywordsPhysical Sciences
dc.subject.keywordsOptics
dc.subject.keywordsCHEMICAL-VAPOR-DEPOSITION
dc.subject.keywordsFABRICATION
dc.titleHWCVD a-Si:H interlayer slope waveguide coupler for multilayer silicon photonics platform
dc.typeJournal article
dc.type.descriptionC1 - Articles
dcterms.bibliographicCitationPetra, R; Oo, SZ; Tarazona, A; Cernansky, R; Reynolds, SA; Khokhar, AZ; Mittal, V; Thomson, DJ; Politi, A; Mashanovich, GZ; Reed, GT; Chong, HMH, HWCVD a-Si:H interlayer slope waveguide coupler for multilayer silicon photonics platform, Optics Express, 2019, 27 (11), pp. 15735-15749
dcterms.licensehttp://creativecommons.org/licenses/by/4.0/
dc.date.updated2020-01-14T01:54:46Z
dc.description.versionVersion of Record (VoR)
gro.rights.copyright© 2019 The Author(s). Published by The Optical Society under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.
gro.hasfulltextFull Text
gro.griffith.authorCernansky, Robert


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