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dc.contributor.authorHu, Shengwei
dc.contributor.authorYang, Dongjiang
dc.contributor.authorXu, Yao
dc.contributor.authorWu, Dong
dc.contributor.authorSun, Yuhan
dc.date.accessioned2017-05-03T14:55:07Z
dc.date.available2017-05-03T14:55:07Z
dc.date.issued2009
dc.date.modified2011-08-12T06:21:55Z
dc.identifier.issn02540584
dc.identifier.doi10.1016/j.matchemphys.2008.10.071
dc.identifier.urihttp://hdl.handle.net/10072/39979
dc.description.abstractA new bridged silsesquioxane (BSQ) was synthesized with isophorone diisocyanate (IPDI) and 3-aminopropyltriethoxysilane (APTES). Highly cross-linked bridged polysilsesquioxane (BPSQ) sol was prepared by the sol-gel polycondensation of the as-synthesized BSQ under basic catalysis. Transparent film was obtained by dip-coating the BPSQ sol on the nickel sulfate hexhydrate (NSH, NiSO4綈2O) crystal wafer, an important kind of UV light filter used at wavelength 300 nm. The obtained BPSQ film was nonporous (pore volume is 2 נ10-3 cm3 g-1) and exhibited very high condensation degree of siloxane (99.0%). This film showed high optical transmittance and excellent moisture-resistant protection to the NSH filter. Moreover, the thermal stability of the NSH filter was also greatly improved by the as-prepared BPSQ film.
dc.description.peerreviewedYes
dc.description.publicationstatusYes
dc.languageEnglish
dc.language.isoeng
dc.publisherElsevier
dc.publisher.placeSwitzerland
dc.relation.ispartofstudentpublicationN
dc.relation.ispartofpagefrom868
dc.relation.ispartofpageto873
dc.relation.ispartofissue2-3
dc.relation.ispartofjournalMaterials Chemistry and Physics
dc.relation.ispartofvolume114
dc.rights.retentionY
dc.subject.fieldofresearchMaterials Engineering not elsewhere classified
dc.subject.fieldofresearchMacromolecular and Materials Chemistry
dc.subject.fieldofresearchMaterials Engineering
dc.subject.fieldofresearchNanotechnology
dc.subject.fieldofresearchcode091299
dc.subject.fieldofresearchcode0303
dc.subject.fieldofresearchcode0912
dc.subject.fieldofresearchcode1007
dc.titleA novel moisture-resistant film for NiSO4·6H2O filter based on isophorone diisocyanate-bridged polysilsesquioxane
dc.typeJournal article
dc.type.descriptionC1 - Articles
dc.type.codeC - Journal Articles
gro.date.issued2009
gro.hasfulltextNo Full Text
gro.griffith.authorYang, Dongjiang


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