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dc.contributor.authorWang, Ruixue
dc.contributor.authorLin, Haofan
dc.contributor.authorGao, Yuan
dc.contributor.authorRen, Chengyan
dc.contributor.authorOstrikov, Kostya Ken
dc.contributor.authorShao, Tao
dc.date.accessioned2021-02-11T02:07:26Z
dc.date.available2021-02-11T02:07:26Z
dc.date.issued2017
dc.identifier.issn0021-8979en_US
dc.identifier.doi10.1063/1.5008645en_US
dc.identifier.urihttp://hdl.handle.net/10072/401978
dc.description.abstractAn effective surface charge removal is critical to diverse applications of polymer and other soft organic materials in electrical devices and systems. Here, we report on the application of atmospheric pressure dielectric barrier discharge (AP-DBD) to deposit SiOx thin films to improve the surface charge dissipation on an epoxy resin surface. The SiOx nanofilms are formed at atmospheric pressure, with the replacement of organic groups (C-H, C=O and C=C) with inorganic groups (Si-O-Si and Si-OH) within the thin surface layer. After the plasma deposition, the initial surface charge decreased by 12% and the surface charge dissipation was accelerated. The flashover voltage which characterizes the insulation property of the epoxy resin is increased by 42%. These improvements are attributed to the lower density of shallow charge traps introduced by SiOx film deposition, which also corresponds to the surface conductivity increase. These results suggest that the SiOx deposition by AP-DBD is promising to accelerate surface charge dissipation. This method is generic, applicable for other types of precursors and may open new avenues for the development of next-generation organic-inorganic insulation materials with customized charge dissipation properties.en_US
dc.description.peerreviewedYesen_US
dc.languageEnglishen_US
dc.publisherAmerican Institute of Physics (AIP Publishing)en_US
dc.relation.ispartofpagefrom233302en_US
dc.relation.ispartofissue23en_US
dc.relation.ispartofjournalJournal of Applied Physicsen_US
dc.relation.ispartofvolume122en_US
dc.subject.fieldofresearchMathematical Sciencesen_US
dc.subject.fieldofresearchPhysical Sciencesen_US
dc.subject.fieldofresearchEngineeringen_US
dc.subject.fieldofresearchcode01en_US
dc.subject.fieldofresearchcode02en_US
dc.subject.fieldofresearchcode09en_US
dc.subject.keywordsScience & Technologyen_US
dc.subject.keywordsPhysics, Applieden_US
dc.subject.keywordsPhysicsen_US
dc.subject.keywordsCHEMICAL-VAPOR-DEPOSITIONen_US
dc.titleInorganic nanofilms for surface charge control on polymer surfaces by atmospheric-pressure plasma depositionen_US
dc.typeJournal articleen_US
dc.type.descriptionC1 - Articlesen_US
dcterms.bibliographicCitationWang, R; Lin, H; Gao, Y; Ren, C; Ostrikov, KK; Shao, T, Inorganic nanofilms for surface charge control on polymer surfaces by atmospheric-pressure plasma deposition, Journal of Applied Physics, 2017, 122 (23), pp. 233302en_US
dc.date.updated2021-02-11T02:04:25Z
dc.description.versionVersion of Record (VoR)en_US
gro.rights.copyright© 2017 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Applied Physics 122, 233302 (2017) and may be found at https://doi.org/10.1063/1.5008645en_US
gro.hasfulltextFull Text
gro.griffith.authorOstrikov, Kostya (Ken)


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