dc.contributor.author | Wu, Bin | |
dc.contributor.author | Kang, Peipei | |
dc.contributor.author | Zhang, Xiumei | |
dc.contributor.author | Nan, Haiyan | |
dc.contributor.author | Ostrikov, Kostya Ken | |
dc.contributor.author | Gu, Xiaofeng | |
dc.contributor.author | Xiao, Shaoqing | |
dc.date.accessioned | 2021-04-22T23:51:53Z | |
dc.date.available | 2021-04-22T23:51:53Z | |
dc.date.issued | 2021 | |
dc.identifier.issn | 0040-6090 | |
dc.identifier.doi | 10.1016/j.tsf.2021.138576 | |
dc.identifier.uri | http://hdl.handle.net/10072/403921 | |
dc.description.abstract | Alloy engineering is of great importance in expanding the two-dimensional (2D) material family and modulating the bandgap of atomically thin 2D transition metal dichalcogenides (TMDs). Here, we report the synthesis of large area and high quality 2H Mo1-xRexS2 (x<=0.02) monolayer crystals by NaCl-assisted and space-confined chemical vapor deposition strategy. The combined effects of both common salt and confined space help promote the growth of Mo1-xRexS2 alloy monolayer crystals. The as-grown Mo1-xRexS2 alloy monolayers are uniformly distributed on the whole growth substrates with a domain size of up to 90 μm. Optical images, X-ray spectroscopy, Raman and photoluminescence spectroscopy measurements and corresponding mapping figures reflect the high quality and uniformity of the monolayers. The Mo1-xRexS2 alloy based phototransistor device exhibit good photoresponse to visible light with a response time of less than 0.2 s. Such alloy engineering of atomically thin 2D TMDs is useful for their future applications in optoelectronics. | |
dc.description.peerreviewed | Yes | |
dc.language | English | |
dc.publisher | Elsevier | |
dc.relation.ispartofpagefrom | 138576 | |
dc.relation.ispartofjournal | Thin Solid Films | |
dc.relation.ispartofvolume | 722 | |
dc.subject.fieldofresearch | Physical sciences | |
dc.subject.fieldofresearch | Engineering | |
dc.subject.fieldofresearchcode | 51 | |
dc.subject.fieldofresearchcode | 40 | |
dc.subject.keywords | Science & Technology | |
dc.subject.keywords | Materials Science, Multidisciplinary | |
dc.subject.keywords | Materials Science, Coatings & Films | |
dc.title | Highly crystalline Mo1-xRexS2 monolayers by NaCl-assisted and space-confined chemical vapor deposition | |
dc.type | Journal article | |
dc.type.description | C1 - Articles | |
dcterms.bibliographicCitation | Wu, B; Kang, P; Zhang, X; Nan, H; Ostrikov, KK; Gu, X; Xiao, S, Highly crystalline Mo1-xRexS2 monolayers by NaCl-assisted and space-confined chemical vapor deposition, Thin Solid Films, 2021, 722, pp. 138576 | |
dc.date.updated | 2021-04-22T23:50:51Z | |
gro.hasfulltext | No Full Text | |
gro.griffith.author | Ostrikov, Ken | |