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dc.contributor.authorWu, Bin
dc.contributor.authorKang, Peipei
dc.contributor.authorZhang, Xiumei
dc.contributor.authorNan, Haiyan
dc.contributor.authorOstrikov, Kostya Ken
dc.contributor.authorGu, Xiaofeng
dc.contributor.authorXiao, Shaoqing
dc.date.accessioned2021-04-22T23:51:53Z
dc.date.available2021-04-22T23:51:53Z
dc.date.issued2021
dc.identifier.issn0040-6090
dc.identifier.doi10.1016/j.tsf.2021.138576
dc.identifier.urihttp://hdl.handle.net/10072/403921
dc.description.abstractAlloy engineering is of great importance in expanding the two-dimensional (2D) material family and modulating the bandgap of atomically thin 2D transition metal dichalcogenides (TMDs). Here, we report the synthesis of large area and high quality 2H Mo1-xRexS2 (x<=0.02) monolayer crystals by NaCl-assisted and space-confined chemical vapor deposition strategy. The combined effects of both common salt and confined space help promote the growth of Mo1-xRexS2 alloy monolayer crystals. The as-grown Mo1-xRexS2 alloy monolayers are uniformly distributed on the whole growth substrates with a domain size of up to 90 μm. Optical images, X-ray spectroscopy, Raman and photoluminescence spectroscopy measurements and corresponding mapping figures reflect the high quality and uniformity of the monolayers. The Mo1-xRexS2 alloy based phototransistor device exhibit good photoresponse to visible light with a response time of less than 0.2 s. Such alloy engineering of atomically thin 2D TMDs is useful for their future applications in optoelectronics.
dc.description.peerreviewedYes
dc.languageEnglish
dc.publisherElsevier
dc.relation.ispartofpagefrom138576
dc.relation.ispartofjournalThin Solid Films
dc.relation.ispartofvolume722
dc.subject.fieldofresearchPhysical sciences
dc.subject.fieldofresearchEngineering
dc.subject.fieldofresearchcode51
dc.subject.fieldofresearchcode40
dc.subject.keywordsScience & Technology
dc.subject.keywordsMaterials Science, Multidisciplinary
dc.subject.keywordsMaterials Science, Coatings & Films
dc.titleHighly crystalline Mo1-xRexS2 monolayers by NaCl-assisted and space-confined chemical vapor deposition
dc.typeJournal article
dc.type.descriptionC1 - Articles
dcterms.bibliographicCitationWu, B; Kang, P; Zhang, X; Nan, H; Ostrikov, KK; Gu, X; Xiao, S, Highly crystalline Mo1-xRexS2 monolayers by NaCl-assisted and space-confined chemical vapor deposition, Thin Solid Films, 2021, 722, pp. 138576
dc.date.updated2021-04-22T23:50:51Z
gro.hasfulltextNo Full Text
gro.griffith.authorOstrikov, Ken


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