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dc.contributor.authorAramesh, Morteza
dc.contributor.authorDjalalian-Assl, Amir
dc.contributor.authorYajadda, Mir Massoud Aghili
dc.contributor.authorPrawer, Steven
dc.contributor.authorOstrikov, Kostya
dc.date.accessioned2021-06-25T04:43:21Z
dc.date.available2021-06-25T04:43:21Z
dc.date.issued2016
dc.identifier.issn1944-8244
dc.identifier.doi10.1021/acsami.5b11182
dc.identifier.urihttp://hdl.handle.net/10072/405375
dc.description.abstractInsulating nanoporous materials are promising platforms for soft-ionizing membranes; however, improvement in fabrication processes and the quality and high breakdown resistance of the thin insulator layers are needed for high integration and performance. Here, scalable fabrication of highly porous, thin, silicon dioxide membranes with controlled thickness is demonstrated using plasma-enhanced chemical-vapor-deposition. The fabricated membranes exhibit good insulating properties with a breakdown voltage of 1 × 107 V/cm. Our calculations suggest that the average electric field inside a nanopore of the membranes can be as high as 1 × 106 V/cm; sufficient for ionization of wide range of molecules. These metal–insulator–metal nanoporous arrays are promising for applications such soft ionizing membranes for mass spectroscopy.
dc.description.peerreviewedYes
dc.languageEnglish
dc.publisherAmerican Chemical Society
dc.relation.ispartofpagefrom4292
dc.relation.ispartofpageto4297
dc.relation.ispartofissue7
dc.relation.ispartofjournalACS Applied Materials & Interfaces
dc.relation.ispartofvolume8
dc.subject.fieldofresearchChemical sciences
dc.subject.fieldofresearchEngineering
dc.subject.fieldofresearchcode34
dc.subject.fieldofresearchcode40
dc.subject.keywordsScience & Technology
dc.subject.keywordsTechnology
dc.subject.keywordsNanoscience & Nanotechnology
dc.subject.keywordsMaterials Science, Multidisciplinary
dc.subject.keywordsScience & Technology - Other Topics
dc.titleThin nanoporous metal–insulator–metal membranes
dc.typeJournal article
dc.type.descriptionC1 - Articles
dcterms.bibliographicCitationAramesh, M; Djalalian-Assl, A; Yajadda, MMA; Prawer, S; Ostrikov, KK, Thin nanoporous metal–insulator–metal membranes, ACS Applied Materials & Interfaces, 2016, 8 (7), pp. 4292-4297
dc.date.updated2021-06-25T04:40:14Z
gro.hasfulltextNo Full Text
gro.griffith.authorOstrikov, Ken


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