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  • Ultra-small photoluminescent silicon-carbide nanocrystals by atmospheric-pressure plasmas

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    Ostrikov201544-Publisher.pdf (2.512Mb)
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    Version of Record (VoR)
    Author(s)
    Askari, Sadegh
    Haq, Atta Ul
    Macias-Montero, Manuel
    Levchenko, Igor
    Yu, Fengjiao
    Zhou, Wuzong
    Ostrikov, Kostya Ken
    Maguire, Paul
    Svrcek, Vladimir
    Mariotti, Davide
    Griffith University Author(s)
    Ostrikov, Ken
    Year published
    2016
    Metadata
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    Abstract
    Highly size-controllable synthesis of free-standing perfectly crystalline silicon carbide nanocrystals has been achieved for the first time through a plasma-based bottom-up process. This low-cost, scalable, ligand-free atmospheric pressure technique allows fabrication of ultra-small (down to 1.5 nm) nanocrystals with very low level of surface contamination, leading to fundamental insights into optical properties of the nanocrystals. This is also confirmed by their exceptional photoluminescence emission yield enhanced by more than 5 times by reducing the nanocrystals sizes in the range of 1-5 nm, which is attributed to quantum ...
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    Highly size-controllable synthesis of free-standing perfectly crystalline silicon carbide nanocrystals has been achieved for the first time through a plasma-based bottom-up process. This low-cost, scalable, ligand-free atmospheric pressure technique allows fabrication of ultra-small (down to 1.5 nm) nanocrystals with very low level of surface contamination, leading to fundamental insights into optical properties of the nanocrystals. This is also confirmed by their exceptional photoluminescence emission yield enhanced by more than 5 times by reducing the nanocrystals sizes in the range of 1-5 nm, which is attributed to quantum confinement in ultra-small nanocrystals. This method is potentially scalable and readily extendable to a wide range of other classes of materials. Moreover, this ligand-free process can produce colloidal nanocrystals by direct deposition into liquid, onto biological materials or onto the substrate of choice to form nanocrystal films. Our simple but efficient approach based on non-equilibrium plasma environment is a response to the need of most efficient bottom-up processes in nanosynthesis and nanotechnology.
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    Journal Title
    Nanoscale
    Volume
    8
    Issue
    39
    DOI
    https://doi.org/10.1039/c6nr03702j
    Copyright Statement
    © The Author(s) 2021. This is an Open Access article distributed under the terms of the Creative Commons Attribution 3.0 Unported (CC BY 3.0) License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
    Subject
    Physical sciences
    Chemical sciences
    Science & Technology
    Chemistry, Multidisciplinary
    Nanoscience & Nanotechnology
    Publication URI
    http://hdl.handle.net/10072/408333
    Collection
    • Journal articles

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