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dc.contributor.authorMeijer, T.
dc.contributor.authorBeardmore, Josh
dc.contributor.authorHM Fabrie, C.
dc.contributor.authorvan Lieshout, J.
dc.contributor.authorJW Notermans, R.
dc.contributor.authorSang, Robert
dc.contributor.authorVredenbregt, E.
dc.contributor.authorvan Leeuwen, K.
dc.date.accessioned2017-07-10T03:37:26Z
dc.date.available2017-07-10T03:37:26Z
dc.date.issued2011
dc.date.modified2012-02-13T05:05:22Z
dc.identifier.issn09462171en_US
dc.identifier.doi10.1007/s00340-011-4743-5en_US
dc.identifier.urihttp://hdl.handle.net/10072/42465
dc.description.abstractAtom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams into line patterns on a substrate. Laser cooled atom beams are commonly used, but an atom beam source with a small opening placed at a large distance from a substrate creates atom beams which are locally geometrically collimated on the substrate. These beams have local offset angles with respect to the substrate. We show that this affects the height, width, shape, and position of the created structures. We find that simulated effects are partially obscured in experiments by substrate-dependent diffusion of atoms, while scattering and interference just above the substrate limit the quality of the standing wave lens. We find that in atom lithography with- out laser cooling the atom beam source geometry is imaged onto the substrate by the standing wave lens. We therefore propose using structured atom beam sources to image more complex patterns on subwavelength scales in a massively parallel way.en_US
dc.description.peerreviewedYesen_US
dc.description.publicationstatusYesen_US
dc.languageEnglishen_US
dc.publisherSpringeren_US
dc.publisher.placeGermanyen_US
dc.relation.ispartofstudentpublicationYen_US
dc.relation.ispartofpagefrom703en_US
dc.relation.ispartofpageto713en_US
dc.relation.ispartofissue4en_US
dc.relation.ispartofjournalApplied Physics B: lasers and opticsen_US
dc.relation.ispartofvolume105en_US
dc.rights.retentionYen_US
dc.subject.fieldofresearchAtomic and Molecular Physicsen_US
dc.subject.fieldofresearchcode020201en_US
dc.titleStructure Formation in atom lithography using geometric collimationen_US
dc.typeJournal articleen_US
dc.type.descriptionC1 - Peer Reviewed (HERDC)en_US
dc.type.codeC - Journal Articlesen_US
dcterms.licensehttp://creativecommons.org/licenses/by/4.0/en_US
dc.description.versionPublisheden_US
gro.rights.copyrightCopyright The Author(s) 2011. This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.en_US
gro.date.issued2011
gro.hasfulltextFull Text


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