X-Ray Photoelectron Spectroscopy Study of Oxide Removal Using Atomic Hydrogen for Large-Area II–VI Material Growth
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This study investigates using atomic hydrogen to clean GaSb (211)B and (111)B substrates as an alternative to thermal desorption under an Sb overpressure. X-ray photoelectron spectroscopy measurement verified the oxide removal on the atomic hydrogen-cleaned GaSb. Atomic force microscopy was used to characterize the surface morphologies of GaSb after atomic hydrogen cleaning with various conditions. All substrates investigated contained a high density of pits that became larger as higher deoxidation temperatures were used, with or without atomic hydrogen. Growth of homoepitaxial GaSb (100) and (211)B was used to compare stoichiometry changes with various oxide removal conditions, and growth effects on sequential epilayers.
Journal of Electronic Materials