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dc.contributor.authorBaker, Marken_US
dc.contributor.authorPalmer, Adamen_US
dc.contributor.authorMacGillivray, Williamen_US
dc.contributor.authorSang, Roberten_US
dc.date.accessioned2017-05-03T11:34:57Z
dc.date.available2017-05-03T11:34:57Z
dc.date.issued2004en_US
dc.date.modified2009-09-14T07:14:03Z
dc.identifier.issn09574484en_US
dc.identifier.doi10.1088/0957-4484/15/9/041en_AU
dc.identifier.urihttp://hdl.handle.net/10072/5774
dc.description.abstractAtomic beams of argon and neon in excited electronic metastable states have been used to pattern bare and dodecanethiol (DDT) resist coated Au/Si substrates. Positive and negative contrast patterning has been observed for DDT-Au/Si, and negative patterning has been observed for bare Au/Si. Our results provide evidence for the formation of these negative patterns resulting from significant background pump oil contamination, and at significantly lower metastable dosages than previously observed. X-ray photoelectron spectroscopy (XPS) results indicate the growth of a carbonaceous layer as the origin of the negative resists in DDT-Au/Si and bare Au/Si substrates. For DDT-Au/Si, results indicate that the transition from positive to negative resist formation relies both on the metastable dosages and level of background pump oil contamination.en_US
dc.description.peerreviewedYesen_US
dc.description.publicationstatusYesen_AU
dc.languageEnglishen_US
dc.language.isoen_AU
dc.publisherInstitute of Physics Publishingen_US
dc.publisher.placeLondonen_US
dc.publisher.urihttp://www.iop.org/EJ/journal/Nanoen_AU
dc.relation.ispartofpagefrom1356en_US
dc.relation.ispartofpageto1362en_US
dc.relation.ispartofjournalNanotechnologyen_US
dc.relation.ispartofvolume15en_US
dc.subject.fieldofresearchcode240301en_US
dc.titleLithographic pattern formation via metastable state rare gas atomic beamsen_US
dc.typeJournal articleen_US
dc.type.descriptionC1 - Peer Reviewed (HERDC)en_US
dc.type.codeC - Journal Articlesen_US
gro.date.issued2004
gro.hasfulltextNo Full Text


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