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dc.contributor.authorBaker, M
dc.contributor.authorPalmer, AJ
dc.contributor.authorMacGillivray, WR
dc.contributor.authorSang, RT
dc.date.accessioned2017-05-03T11:34:57Z
dc.date.available2017-05-03T11:34:57Z
dc.date.issued2004
dc.date.modified2009-09-14T07:14:03Z
dc.identifier.issn0957-4484
dc.identifier.doi10.1088/0957-4484/15/9/041
dc.identifier.urihttp://hdl.handle.net/10072/5774
dc.description.abstractAtomic beams of argon and neon in excited electronic metastable states have been used to pattern bare and dodecanethiol (DDT) resist coated Au/Si substrates. Positive and negative contrast patterning has been observed for DDT-Au/Si, and negative patterning has been observed for bare Au/Si. Our results provide evidence for the formation of these negative patterns resulting from significant background pump oil contamination, and at significantly lower metastable dosages than previously observed. X-ray photoelectron spectroscopy (XPS) results indicate the growth of a carbonaceous layer as the origin of the negative resists in DDT-Au/Si and bare Au/Si substrates. For DDT-Au/Si, results indicate that the transition from positive to negative resist formation relies both on the metastable dosages and level of background pump oil contamination.
dc.description.peerreviewedYes
dc.description.publicationstatusYes
dc.languageEnglish
dc.language.isoeng
dc.publisherInstitute of Physics Publishing
dc.publisher.placeLondon
dc.publisher.urihttps://iopscience.iop.org/journal/0957-4484
dc.relation.ispartofpagefrom1356
dc.relation.ispartofpageto1362
dc.relation.ispartofjournalNanotechnology
dc.relation.ispartofvolume15
dc.subject.fieldofresearchcode240301
dc.titleLithographic pattern formation via metastable state rare gas atomic beams
dc.typeJournal article
dc.type.descriptionC1 - Articles
dc.type.codeC - Journal Articles
gro.date.issued2004
gro.hasfulltextNo Full Text
gro.griffith.authorMacGillivray, William R.
gro.griffith.authorSang, Robert T.


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