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dc.contributor.authorZ. Khokhar, Alien_US
dc.contributor.authorParsons, Keithen_US
dc.contributor.authorHubbard, Grahamen_US
dc.contributor.authorRahman, Faizen_US
dc.contributor.authorS. Macintyre, Douglasen_US
dc.contributor.authorXiong, Changen_US
dc.contributor.authorMassoubre, Daviden_US
dc.contributor.authorGong, Zhengen_US
dc.contributor.authorP. Johnson, Nigelen_US
dc.contributor.authorM. De La Rue, Richarden_US
dc.contributor.authorM. Watson, Ianen_US
dc.contributor.authorGu, Erdanen_US
dc.contributor.authorD. Dawson, Martinen_US
dc.contributor.authorJ. Abbott, Steveen_US
dc.contributor.authorD.B. Charlton, Martinen_US
dc.contributor.authorTillin, Martinen_US
dc.date.accessioned2017-05-03T12:44:37Z
dc.date.available2017-05-03T12:44:37Z
dc.date.issued2010en_US
dc.date.modified2014-07-22T04:31:39Z
dc.identifier.issn01679317en_US
dc.identifier.doi10.1016/j.mee.2010.02.003en_US
dc.identifier.urihttp://hdl.handle.net/10072/61603
dc.description.abstractWe describe a comparison of nanofabrication technologies for the fabrication of 2D photonic crystal structures on GaN/InGaN blue LEDs. Such devices exhibit enhanced brightness and the possibility of controlling the angular emission profile of emitted light. This paper describes three nano lithography techniques for patterning photonic crystal structures on the emitting faces of LEDs: direct-write electron beam lithography, hard stamp nanoimprint lithography and soft-stamp nanoimprint lithography with disposable embossing masters. In each case we describe variations on the technique as well as its advantages and disadvantages. Complete process details have been given for all three techniques. In addition, we show how high performance GaN dry etch techniques, coupled with optical process monitoring can transfer resist patterns into underlying GaN material with high fidelity.en_US
dc.description.peerreviewedYesen_US
dc.description.publicationstatusYesen_US
dc.languageEnglishen_US
dc.publisherElsevier BVen_US
dc.publisher.placeNetherlandsen_US
dc.relation.ispartofstudentpublicationNen_US
dc.relation.ispartofpagefrom2200en_US
dc.relation.ispartofpageto2207en_US
dc.relation.ispartofissue11en_US
dc.relation.ispartofjournalMicroelectronic Engineeringen_US
dc.relation.ispartofvolume87en_US
dc.rights.retentionYen_US
dc.subject.fieldofresearchMicroelectronics and Integrated Circuitsen_US
dc.subject.fieldofresearchcode090604en_US
dc.titleNanofabrication of gallium nitride photonic crystal light-emitting diodesen_US
dc.typeJournal articleen_US
dc.type.descriptionC1 - Peer Reviewed (HERDC)en_US
dc.type.codeC - Journal Articlesen_US
gro.hasfulltextNo Full Text
gro.griffith.authorMassoubre, David


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