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  • Single-crystalline 3C-SiC thin-film on large Si substrate for photonic applications

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    99552_1.pdf (2.328Mb)
    Author(s)
    Massoubre, D
    Wang, L
    Chai, J
    Walker, G
    Hold, L
    Lobino, M
    Dimitriev, S
    Iacopi, A
    Griffith University Author(s)
    Dimitrijev, Sima
    Walker, Glenn M.
    Iacopi, Alan V.
    Wang, Li
    Hold, Leonie K.
    Lobino, Mirko
    Massoubre, David
    Chai, Jessica H.
    Year published
    2014
    Metadata
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    Abstract
    This paper presents an unique low-temperature chemical vapor deposition process developed at Griffith University that enables the hetero-epitaxial growth of uniform single-crystalline cubic silicon carbide thin-film on very large silicon substrate. This technology, combined with the unique properties of silicon carbide, opens new opportunities for photonic applications on silicon.This paper presents an unique low-temperature chemical vapor deposition process developed at Griffith University that enables the hetero-epitaxial growth of uniform single-crystalline cubic silicon carbide thin-film on very large silicon substrate. This technology, combined with the unique properties of silicon carbide, opens new opportunities for photonic applications on silicon.
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    Conference Title
    Technical Proceedings of the 2014 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2014
    Volume
    2
    Publisher URI
    http://www.techconnectworld.com/Nanotech2014/
    https://www.nsti.org/procs/Nanotech2014v2/7/T8.173
    Copyright Statement
    © 2014 NSTI http://nsti.org. Reprinted and revised, with permission, from the Nanotechnology 2014: MEMS, Fluidics, Bio Systems, Medical, Computational & Photonics (Volume 2), pp. 416-419, 15-18 Jun 2014, Washington DC, U.S.A.
    Subject
    Photonics, optoelectronics and optical communications
    Publication URI
    http://hdl.handle.net/10072/65943
    Collection
    • Conference outputs

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