Show simple item record

dc.contributor.convenorMichael Gal
dc.contributor.authorBaker, M
dc.contributor.authorPalmer, AJ
dc.contributor.authorSang, RT
dc.contributor.editorGal, M
dc.date.accessioned2017-05-03T11:34:57Z
dc.date.available2017-05-03T11:34:57Z
dc.date.issued2002
dc.date.modified2008-09-10T06:04:45Z
dc.identifier.isbn0-7803-7571-8
dc.identifier.doi10.1109/COMMAD.2002.1237227
dc.identifier.urihttp://hdl.handle.net/10072/8867
dc.description.abstractWe have used a metastable argon beam to expose gold-coated silicon substrates covered with a self assembled monolayer (SAM) resist. The substrates have been covered with a patterned mask, with feamres of 10 pm size, and exposed to the atomic beam. Subsequent etching revealed negative contrast patterns, consistent with the formation of a negative contamination resist in the SAM, which we attribute to background pump oil vapour. Metastable dosages of 9x10L4a toms cnY2 and exposure times < 1 hr have been sufficient to produce reliable negative resists.
dc.description.peerreviewedYes
dc.description.publicationstatusYes
dc.format.extent14357 bytes
dc.format.extent303183 bytes
dc.format.mimetypetext/plain
dc.format.mimetypeapplication/pdf
dc.languageEnglish
dc.language.isoeng
dc.publisherInstitute of Electrical and Electronic Engineers, Inc.
dc.publisher.placeNew Jersey
dc.publisher.urihttp://www.ieee.org/portal/site
dc.relation.ispartofconferencenameConference on Optoelectronic and Microelectronic Materials and Devices (COMMAD)
dc.relation.ispartofconferencetitleCOMMAD 2002 PROCEEDINGS
dc.relation.ispartofdatefrom2002-12-11
dc.relation.ispartofdateto2002-12-13
dc.relation.ispartoflocationUNIV NEW S WALES, SYDNEY, AUSTRALIA
dc.relation.ispartofpagefrom201
dc.relation.ispartofpagefrom4 pages
dc.relation.ispartofpageto204
dc.relation.ispartofpageto4 pages
dc.relation.ispartofvolume2002-January
dc.subject.fieldofresearchcode240301
dc.titleContamination resists in metastable atom lithography
dc.typeConference output
dc.type.descriptionE1 - Conferences
dc.type.codeE - Conference Publications
gro.rights.copyright© 2002 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
gro.date.issued2002
gro.hasfulltextFull Text
gro.griffith.authorSang, Robert T.


Files in this item

This item appears in the following Collection(s)

  • Conference outputs
    Contains papers delivered by Griffith authors at national and international conferences.

Show simple item record