dc.contributor.convenor | Michael Gal | |
dc.contributor.author | Baker, M | |
dc.contributor.author | Palmer, AJ | |
dc.contributor.author | Sang, RT | |
dc.contributor.editor | Gal, M | |
dc.date.accessioned | 2017-05-03T11:34:57Z | |
dc.date.available | 2017-05-03T11:34:57Z | |
dc.date.issued | 2002 | |
dc.date.modified | 2008-09-10T06:04:45Z | |
dc.identifier.isbn | 0-7803-7571-8 | |
dc.identifier.doi | 10.1109/COMMAD.2002.1237227 | |
dc.identifier.uri | http://hdl.handle.net/10072/8867 | |
dc.description.abstract | We have used a metastable argon beam to expose gold-coated silicon substrates covered with a self assembled monolayer (SAM) resist. The substrates have been covered with a patterned mask, with feamres of 10 pm size, and exposed to the atomic beam. Subsequent etching revealed negative contrast patterns, consistent with the formation of a negative contamination resist in the SAM, which we attribute to background pump oil vapour. Metastable dosages of 9x10L4a toms cnY2 and exposure times < 1 hr have been sufficient to produce reliable negative resists. | |
dc.description.peerreviewed | Yes | |
dc.description.publicationstatus | Yes | |
dc.format.extent | 14357 bytes | |
dc.format.extent | 303183 bytes | |
dc.format.mimetype | text/plain | |
dc.format.mimetype | application/pdf | |
dc.language | English | |
dc.language.iso | eng | |
dc.publisher | Institute of Electrical and Electronic Engineers, Inc. | |
dc.publisher.place | New Jersey | |
dc.publisher.uri | http://www.ieee.org/portal/site | |
dc.relation.ispartofconferencename | Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD) | |
dc.relation.ispartofconferencetitle | COMMAD 2002 PROCEEDINGS | |
dc.relation.ispartofdatefrom | 2002-12-11 | |
dc.relation.ispartofdateto | 2002-12-13 | |
dc.relation.ispartoflocation | UNIV NEW S WALES, SYDNEY, AUSTRALIA | |
dc.relation.ispartofpagefrom | 201 | |
dc.relation.ispartofpagefrom | 4 pages | |
dc.relation.ispartofpageto | 204 | |
dc.relation.ispartofpageto | 4 pages | |
dc.relation.ispartofvolume | 2002-January | |
dc.subject.fieldofresearchcode | 240301 | |
dc.title | Contamination resists in metastable atom lithography | |
dc.type | Conference output | |
dc.type.description | E1 - Conferences | |
dc.type.code | E - Conference Publications | |
gro.rights.copyright | © 2002 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. | |
gro.date.issued | 2002 | |
gro.hasfulltext | Full Text | |
gro.griffith.author | Sang, Robert T. | |