• myGriffith
    • Staff portal
    • Contact Us⌄
      • Future student enquiries 1800 677 728
      • Current student enquiries 1800 154 055
      • International enquiries +61 7 3735 6425
      • General enquiries 07 3735 7111
      • Online enquiries
      • Staff phonebook
    View Item 
    •   Home
    • Griffith Research Online
    • Conference outputs
    • View Item
    • Home
    • Griffith Research Online
    • Conference outputs
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Browse

  • All of Griffith Research Online
    • Communities & Collections
    • Authors
    • By Issue Date
    • Titles
  • This Collection
    • Authors
    • By Issue Date
    • Titles
  • Statistics

  • Most Popular Items
  • Statistics by Country
  • Most Popular Authors
  • Support

  • Contact us
  • FAQs
  • Admin login

  • Login
  • Techniques for micromachining multilayered structures in silicon

    Thumbnail
    View/Open
    14034_1.pdf (308.7Kb)
    Author(s)
    Powell, Oliver
    Sweatman, Denis
    Harrison, Barry
    Griffith University Author(s)
    Harrison, Barry B.
    Sweatman, Denis R.
    Powell, Oliver J.
    Year published
    2000
    Metadata
    Show full item record
    Abstract
    The effects of wet anisotropic etching of [100] silicon were studied with mask edges aligned at 45/spl deg/ to the primary wafer. Samples were etched in aqueous KOH solution with the addition of isopropyl alcohol (IPA). The addition of IPA caused a change from the formation of vertical {100} walls to sloping {110} walls only for solutions below a critical concentration and temperature. The dependence on concentration was then applied to produce a new multilayer structure with {110} walls fabricated on top of {100} walls.The effects of wet anisotropic etching of [100] silicon were studied with mask edges aligned at 45/spl deg/ to the primary wafer. Samples were etched in aqueous KOH solution with the addition of isopropyl alcohol (IPA). The addition of IPA caused a change from the formation of vertical {100} walls to sloping {110} walls only for solutions below a critical concentration and temperature. The dependence on concentration was then applied to produce a new multilayer structure with {110} walls fabricated on top of {100} walls.
    View less >
    Conference Title
    Conference on Optoelectonic and Microelectronic materials and devices
    DOI
    https://doi.org/10.1109/COMMAD.2000.1022976
    Copyright Statement
    © 2000 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
    Subject
    History and Archaeology
    Publication URI
    http://hdl.handle.net/10072/9351
    Collection
    • Conference outputs

    Footer

    Disclaimer

    • Privacy policy
    • Copyright matters
    • CRICOS Provider - 00233E

    Tagline

    • Gold Coast
    • Logan
    • Brisbane - Queensland, Australia
    First Peoples of Australia
    • Aboriginal
    • Torres Strait Islander