Distribution and Chemical Bonding of N at NO Nitrided SiC/SiO2 Interface

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Author(s)
Li, HF
Dimitrijev, S
Sweatman, D
Harrison, HB
Tanner, P
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Faraone, L., Dell,J.M., Fisher, T.A., Musca, C.A., Nener, B.D.
Date
1999
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228209 bytes
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Perth, Australia
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Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
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© 1999 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
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History, heritage and archaeology
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