Iron structures with dimensions of the order of the minimum domain size (~50 nm at room temperature) may provide us with a new high-density data storage method. Limitations have been observed in existing depositional atom lithography schemes for producing these structures. We present a proof-in-principle experiment using an alternative scheme based upon direct exposure metastable neon-atom lithography. Iron structures with dimensions of the order of 7.5 孠are produced by this method. Extension of this work to the application of standing-wave atom lithography and laser cooling flux enhancement techniques is discussed as a method for reducing dimensions to a size equating to a dot array density of around 0.1 Gbit mm-2.