HWCVD a-Si:H interlayer slope waveguide coupler for multilayer silicon photonics platform

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Author(s)
Petra, Rafidah
Oo, Swe Zin
Tarazona, Antulio
Cernansky, Robert
Reynolds, Scott A
Khokhar, Ali Z
Mittal, Vinita
Thomson, David J
Politi, Alberto
Mashanovich, Goran Z
Reed, Graham T
Chong, Harold MH
Griffith University Author(s)
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2019
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Abstract

We present interlayer slope waveguides, designed to guide light from one level to another in a multi-layer silicon photonics platform. The waveguide is fabricated from hydrogenated amorphous silicon (a-Si:H) film, deposited using hot-wire chemical vapor deposition (HWCVD) at a temperature of 230°C. The interlayer slope waveguide is comprises of a lower level input waveguide and an upper level output waveguide, connected by a waveguide on a slope, with vertical separation to isolate other crossing waveguides. Measured loss of 0.17 dB/slope was obtained for waveguide dimensions of 600 nm waveguide width (w) and 400 nm core thickness (h) at a wavelength of 1550 nm and for transverse electric (TE) mode polarization.

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Optics Express

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27

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11

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© 2019 The Author(s). Published by The Optical Society under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI.

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Atomic, molecular and optical physics

Communications engineering

Science & Technology

Physical Sciences

Optics

CHEMICAL-VAPOR-DEPOSITION

FABRICATION

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Petra, R; Oo, SZ; Tarazona, A; Cernansky, R; Reynolds, SA; Khokhar, AZ; Mittal, V; Thomson, DJ; Politi, A; Mashanovich, GZ; Reed, GT; Chong, HMH, HWCVD a-Si:H interlayer slope waveguide coupler for multilayer silicon photonics platform, Optics Express, 2019, 27 (11), pp. 15735-15749

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