Top-down patterning of topological surface and edge states using a focused ion beam
File version
Version of Record (VoR)
Author(s)
Zhang, Qi
Ho, Cong Son
Causer, Grace L
Zhao, Weiyao
Yue, Zengji
Nguyen, Alexander
Akhgar, Golrokh
Karel, Julie
Mitchell, David
Pastuovic, Zeljko
Lewis, Roger
Cole, Jared H
Nancarrow, Mitchell
Valanoor, Nagarajan
et al.
Griffith University Author(s)
Primary Supervisor
Other Supervisors
Editor(s)
Date
Size
File type(s)
Location
Abstract
The conducting boundary states of topological insulators appear at an interface where the characteristic invariant ℤ2 switches from 1 to 0. These states offer prospects for quantum electronics; however, a method is needed to spatially-control ℤ2 to pattern conducting channels. It is shown that modifying Sb2Te3 single-crystal surfaces with an ion beam switches the topological insulator into an amorphous state exhibiting negligible bulk and surface conductivity. This is attributed to a transition from ℤ2= 1 → ℤ2= 0 at a threshold disorder strength. This observation is supported by density functional theory and model Hamiltonian calculations. Here we show that this ion-beam treatment allows for inverse lithography to pattern arrays of topological surfaces, edges and corners which are the building blocks of topological electronics.
Journal Title
Nature Communications
Conference Title
Book Title
Edition
Volume
14
Issue
Thesis Type
Degree Program
School
Publisher link
Patent number
Funder(s)
Grant identifier(s)
Rights Statement
Rights Statement
© Crown 2023. Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
Item Access Status
Note
Access the data
Related item(s)
Subject
Persistent link to this record
Citation
Bake, A; Zhang, Q; Ho, CS; Causer, GL; Zhao, W; Yue, Z; Nguyen, A; Akhgar, G; Karel, J; Mitchell, D; Pastuovic, Z; Lewis, R; Cole, JH; Nancarrow, M; Valanoor, N; Wang, X; Cortie, D, Top-down patterning of topological surface and edge states using a focused ion beam, Nature Communications, 2023, 14, pp. 1693