A proposed nanofabrication technique using optical masks for metastable atom lithography
File version
Author(s)
Palmer, AJ
Sang, RT
Griffith University Author(s)
Primary Supervisor
Other Supervisors
Editor(s)
Rakic, AD
Yeow, YT
Date
Size
700009 bytes
File type(s)
application/pdf
Location
Univ Queensland, Brisbane, AUSTRALIA
License
Abstract
We present an overview of our progress towards using optical fields as 'light masks' for metastable atomic beam lithography. Numerical simulations have been undertaken to model the interaction of a beam of metastable neon atoms with a standing wave of 640.2 nm laser light. The current experimental setup and the proposed scheme for focusing the atoms is detailed
Journal Title
Conference Title
Commad 04: 2004 Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings
Book Title
Edition
Volume
Issue
Thesis Type
Degree Program
School
Publisher link
Patent number
Funder(s)
Grant identifier(s)
Rights Statement
Rights Statement
© 2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.