Nanofabrication of gallium nitride photonic crystal light-emitting diodes

No Thumbnail Available
File version
Author(s)
Z. Khokhar, Ali
Parsons, Keith
Hubbard, Graham
Rahman, Faiz
S. Macintyre, Douglas
Xiong, Chang
Massoubre, David
Gong, Zheng
P. Johnson, Nigel
M. De La Rue, Richard
M. Watson, Ian
Gu, Erdan
D. Dawson, Martin
J. Abbott, Steve
D.B. Charlton, Martin
Tillin, Martin
Griffith University Author(s)
Primary Supervisor
Other Supervisors
Editor(s)
Date
2010
Size
File type(s)
Location
License
Abstract

We describe a comparison of nanofabrication technologies for the fabrication of 2D photonic crystal structures on GaN/InGaN blue LEDs. Such devices exhibit enhanced brightness and the possibility of controlling the angular emission profile of emitted light. This paper describes three nano lithography techniques for patterning photonic crystal structures on the emitting faces of LEDs: direct-write electron beam lithography, hard stamp nanoimprint lithography and soft-stamp nanoimprint lithography with disposable embossing masters. In each case we describe variations on the technique as well as its advantages and disadvantages. Complete process details have been given for all three techniques. In addition, we show how high performance GaN dry etch techniques, coupled with optical process monitoring can transfer resist patterns into underlying GaN material with high fidelity.

Journal Title

Microelectronic Engineering

Conference Title
Book Title
Edition
Volume

87

Issue

11

Thesis Type
Degree Program
School
Publisher link
Patent number
Funder(s)
Grant identifier(s)
Rights Statement
Rights Statement
Item Access Status
Note
Access the data
Related item(s)
Subject

Microelectronics and Integrated Circuits

Condensed Matter Physics

Other Physical Sciences

Electrical and Electronic Engineering

Persistent link to this record
Citation
Collections