Immobilization of Dendrimers on Si-C Linked Carboxyalic Acid-Terminated Monolayers on Silicon(111)

Loading...
Thumbnail Image
File version
Author(s)
Bocking, Till
Wong, Elicia LS
James, Michael
Watson, Jolanta A
Brown, Christopher L
Chilcott, Terry C
Barrow, Kevin D
Coster, Hans GL
Griffith University Author(s)
Primary Supervisor
Other Supervisors
Editor(s)

J E Greene

Date
2006
Size

373071 bytes

33752 bytes

File type(s)

application/pdf

text/plain

Location
License
Abstract

Poly(amidoamine) dendrimers were attached to activated undecanoic acid monolayers, covalently linked to smooth silicon surfaces via Si-C bonds. The resulting ultra-thin dendrimer films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray reflectometry (XR) and atomic force microscopy (AFM). XPS results suggested amide bond formation between the dendrimer and the surface carboxylic acid groups. XR yielded thicknesses of 10 Šfor the alkyl region of the undecanoic acid monolayer and 12 Šfor the dendrimer layer, considerably smaller than the diameter of these spherical macromolecules in solution. This was consistent with AFM images showing collapsed dendrimers on the surface. It was concluded that the deformation arose from a large number of amine groups on the surface of each dendrimer reacting efficiently with the activated surface, whereby the dendrimers can deform to fill voids while spreading over the activated surface to form a homogeneous macromolecular layer.

Journal Title

Thin Solid Films

Conference Title
Book Title
Edition
Volume

515

Issue

4

Thesis Type
Degree Program
School
Patent number
Funder(s)
Grant identifier(s)
Rights Statement
Rights Statement

© 2006 Elsevier. Reproduced in accordance with the copyright policy of the publisher. This journal is available online, use hypertext links.

Item Access Status
Note
Access the data
Related item(s)
Subject

Physical sciences

Engineering

Persistent link to this record
Citation
Collections