Fourfold Polarization-Sensitive Photodetector Based on GaTe/MoS2 van der Waals Heterojunction
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Nan, Haiyan
Fu, Quangui
Zhang, Xiumei
Liu, Xing
Ni, Zhenhua
(Ken) Ostrikov, Kostya
Xiao, Shaoqing
Gu, Xiaofeng
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Abstract
Integrated polarization-sensitive photodetectors fabricated by geometric anisotropic 2D materials have become attractive in recent years. In this work, the successful construction of self-driven and polarization-sensitive photodetectors based on GaTe/MoS2 p–n van der Waals (vdW) heterojunction is demonstrated by mechanical exfoliation and dry transfer methods. The fabricated GaTe/MoS2 vdW heterojunctions show ambipolar behavior, and the highest rectification ratio can reach 93.4. The highest responsivity under 532 nm illumination reaches 145 mA W−1 and the response time is less than 10 ms. Moreover, the photocurrent polarization of the fabricated GaTe/MoS2 photodetectors manifests in fourfold anisotropy with a high polarization ratio of 2.9, which can be ascribed to the highly anisotropic monoclinic structure of layered m-GaTe. This finding thus offers more information and creates new opportunities about how to fabricate integrated polarization-sensitive photodetectors.
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Advanced Electronic Materials
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Electrical engineering
Materials engineering
Science & Technology
Physical Sciences
Nanoscience & Nanotechnology
Materials Science, Multidisciplinary
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Tan, J; Nan, H; Fu, Q; Zhang, X; Liu, X; Ni, Z; (Ken) Ostrikov, K; Xiao, S; Gu, X, Fourfold Polarization-Sensitive Photodetector Based on GaTe/MoS2 van der Waals Heterojunction, Advanced Electronic Materials, 2021