ScAlN/3C-SiC/Si platform for monolithic integration of highly sensitive piezoelectric and piezoresistive devices

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Qamar, Afzaal
Hoang-Phuong, Phan
Toan, Dinh
Nam-Trung, Nguyen
Rais-Zadeh, Mina
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2020
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Abstract

This paper reports on a platform for monolithic integration of piezoelectric and piezoresistive devices on a single chip using the ScAlN/3C-SiC/Si heterostructure. Surface acoustic wave devices with an electromechanical coupling of 3.2% and an out-of-band rejection as high as 18 dB are demonstrated using the excellent piezoelectric properties of ScAlN and low acoustic loss of 3C-SiC. Additionally, a large piezoresistive effect in the low-doped n-type 3C-SiC(100) thin film has been observed, which exceeds the previously reported values in any SiC thin films. The growth of the n-type 3C-SiC thin film was performed using the low pressure chemical vapor deposition technique at 1250 °C and the standard micro-electro-mechanical systems process is used for the fabrication of 3C-SiC piezoresistors. The piezoresistive effect was measured using the bending beam method in different crystallographic orientations. The maximum gauge factor is -47 for the longitudinal [100] orientation. Using the longitudinal and transverse gauge factors for different crystallographic orientations, the fundamental piezoresistive coefficients of the low-doped n-type 3C-SiC thin film are measured to be π 11 = (- 14.5 ± 1.3) × 10 - 11 Pa-1, π 12 = (5.5 ± 0.5) × 10 - 11 Pa-1, and π 44 = (- 1.7 ± 0.7) × 10 - 11 Pa-1,.

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Applied Physics Letters

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116

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13

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Physical sciences

Engineering

Science & Technology

Physics, Applied

Physics

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Qamar, A; Hoang-Phuong, P; Toan, D; Nam-Trung, N; Rais-Zadeh, M, ScAlN/3C-SiC/Si platform for monolithic integration of highly sensitive piezoelectric and piezoresistive devices, Applied Physics Letters, 2020, 116 (13), pp. 132902:1-132902:5

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